文献
J-GLOBAL ID:200902272897281963
整理番号:08A1148562
シングル金属/ゲートファーストプロセスによる低電力用途のためのコスト有効32nm高k/金属ゲートCMOS技術
A Cost Effective 32nm High-K/Metal Gate CMOS Technology for Low Power Applications with Single-Metal/Gate-First Process
著者 (40件):
CHEN X.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
SAMAVEDAM S.
(Freescale Semiconductor)
,
NARAYANAN V.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
STEIN K.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
HOBBS C.
(Freescale Semiconductor)
,
BAIOCCO C.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
LI W.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
JAEGER D.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
ZALESKI M.
(Freescale Semiconductor)
,
YANG H. S.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
KIM N.
(Chartered Semiconductor Manufacturing)
,
LEE Y.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
ZHANG D.
(Freescale Semiconductor)
,
KANG L.
(Freescale Semiconductor)
,
CHEN J.
(Chartered Semiconductor Manufacturing)
,
ZHUANG H.
(Infineon Technol. AG)
,
SHEIKH A.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
WALLNER J.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
AQUILINO M.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
HAN J.
(Infineon Technol. AG)
,
JIN Z.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
LI J.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
MASSEY G.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
KALPAT S.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
JHA R.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
MOUMEN N.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
MO R.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
KIRSHNAN A.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
WANG X.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
CHUDZIK M.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
CHOWDHURY M.
(Freescale Semiconductor)
,
NAIR D.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
REDDY C.
(Freescale Semiconductor)
,
TEH Y. W.
(Chartered Semiconductor Manufacturing)
,
KOTHANDARAMAN C.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
COOLBAUGH D.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
,
PANDEY S.
(Chartered Semiconductor Manufacturing)
,
TEKLEAB D.
(Chartered Semiconductor Manufacturing)
,
THEAN A.
(Freescale Semiconductor)
,
SHERONY M.
(IBM Semiconductor Res. and Dev. Center (SRDC), NY)
資料名:
Digest of Technical Papers. Symposium on VLSI Technology
(Digest of Technical Papers. Symposium on VLSI Technology)
巻:
2008
ページ:
67-68
発行年:
2008年
JST資料番号:
A0035B
ISSN:
0743-1562
資料種別:
会議録 (C)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)