文献
J-GLOBAL ID:200902279562921490
整理番号:08A0452360
機能性高密度SRAMのファンドリ適用用の32nm CMOS低消費電力SoCプラットフォーム技術
A 32nm CMOS Low Power SoC Platform Technology for Foundry Applications with Functional High Density SRAM
著者 (40件):
WU Shien-Yang
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHOU C.W.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIN C.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHIANG M.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
YANG C.K.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIU M.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
HU L.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHANG C.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
WU P.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIN C.I.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHEN H.F.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHANG S.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
WANG S.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
TONG P.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
HSIEH Y.L.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
TONG P.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIAW J.J.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
PAN K.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
HSIEH C.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHEN C.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHENG J.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
YAO C.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
WAN W.K.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LEE T.L.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
HUANG K.T.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHEN C.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIN K.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
YEH L.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
KU K.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHEN S.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHANG C.W.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LIN H.J.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
JANG S.M.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
LU Y.C.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
SHIEH J.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
TSAI M.H.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
SONG J.Y.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHEN K.S.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHANG V.
(Taiwan Semiconductor Manufacturing Co., TWN)
,
CHENG S.M.
(Taiwan Semiconductor Manufacturing Co., TWN)
資料名:
Technical Digest. International Electron Devices Meeting
(Technical Digest. International Electron Devices Meeting)
巻:
2007 Vol.1
ページ:
263-266
発行年:
2007年
JST資料番号:
C0829B
ISSN:
0163-1918
資料種別:
会議録 (C)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)