文献
J-GLOBAL ID:200902288415016323
整理番号:06A0503430
人工的な周期溝を持つ熱酸化シリコン表面上のセキシチオフェンのグラフォエピタクシー
Graphoepitaxy of sexithiophene on thermally oxidized silicon surface with artificial periodic grooves
著者 (10件):
IKEDA Susumu
(Dep. of Complexity Sci. and Engineering, Graduate School of Frontier Sciences, The Univ. of Tokyo, Kashiwanoha 5-1-5 ...)
,
SAIKI Koichiro
(Dep. of Complexity Sci. and Engineering, Graduate School of Frontier Sciences, The Univ. of Tokyo, Kashiwanoha 5-1-5 ...)
,
TSUTSUI Ken
(Nanotechnology Res. Lab., Waseda Univ., Wasedatsurumaki-cho, Shinjuku-ku, Tokyo 162-0041, JPN)
,
EDURA Tomohiko
(Nanotechnology Res. Lab., Waseda Univ., Wasedatsurumaki-cho, Shinjuku-ku, Tokyo 162-0041, JPN)
,
WADA Yasuo
(Nanotechnology Res. Lab., Waseda Univ., Wasedatsurumaki-cho, Shinjuku-ku, Tokyo 162-0041, JPN)
,
MIYAZOE Hiroyuki
(Dep. of Advanced Materials Sci., Graduate School of Frontier Sciences, The Univ. of Tokyo, Kashiwanoha 5-1-5 ...)
,
TERASHIMA Kazuo
(Dep. of Advanced Materials Sci., Graduate School of Frontier Sciences, The Univ. of Tokyo, Kashiwanoha 5-1-5 ...)
,
INABA Katsuhiko
(Rigaku Corp., 3-9-12 Matsubara-cho, Akishima, Tokyo 196-8666, JPN)
,
MITSUNAGA Toru
(Rigaku Corp., 3-9-12 Matsubara-cho, Akishima, Tokyo 196-8666, JPN)
,
SHIMADA Toshihiro
(Dep. of Chemistry, The Univ. of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, JPN)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
88
号:
25
ページ:
251905-251905-3
発行年:
2006年06月19日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)