文献
J-GLOBAL ID:201002242140253126
整理番号:10A0538024
半導体-電解質界面でのキャリア収集の制御による配列した深い孔の直径の調整のための電気化学的エッチング過程
Electrochemical etching process to tune the diameter of arrayed deep pores by controlling carrier collection at a semiconductor-electrolyte interface
著者 (5件):
SATO Hirotaka
(Dep. of Applied Chemistry, School of Sci. and Engineering, Waseda Univ., Okubo, Shinjuku-ku, Tokyo 169-8555, JPN)
,
YAMAGUCHI Takuya
(Dep. of Applied Chemistry, School of Sci. and Engineering, Waseda Univ., Okubo, Shinjuku-ku, Tokyo 169-8555, JPN)
,
ISOBE Tetsuhiko
(Dep. of Applied Chemistry, School of Sci. and Engineering, Waseda Univ., Okubo, Shinjuku-ku, Tokyo 169-8555, JPN)
,
SHOJI Shuichi
(Dep. of Electrical Engineering and Bioscience, School of Sci. and Engineering, Waseda Univ., Okubo, Shinjuku-ku ...)
,
HOMMA Takayuki
(Dep. of Applied Chemistry, School of Sci. and Engineering, Waseda Univ., Okubo, Shinjuku-ku, Tokyo 169-8555, JPN)
資料名:
Electrochemistry Communications
(Electrochemistry Communications)
巻:
12
号:
6
ページ:
765-768
発行年:
2010年06月
JST資料番号:
W1133A
ISSN:
1388-2481
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
オランダ (NLD)
言語:
英語 (EN)