文献
J-GLOBAL ID:201002245043933111
整理番号:10A1623893
二次中性質量分析によるNi-Si系の温度誘起工程における個々の界面のシフトのナノ規模での研究
Nanoscale investigations of shift of individual interfaces in temperature induced processes of Ni-Si system by secondary neutral mass spectrometry
著者 (11件):
LAKATOS A.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
LANGER G. A.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
CSIK A.
(Inst. of Nuclear Res., Hungarian Acad. of Sciences (ATOMKI), H-4001 Debrecen P.O. Box 51, HUN)
,
CSERHATI C.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
KIS-VARGA M.
(Inst. of Nuclear Res., Hungarian Acad. of Sciences (ATOMKI), H-4001 Debrecen P.O. Box 51, HUN)
,
DAROCZI L.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
KATONA G. L.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
ERDELYI Z.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
ERDELYI G.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
,
VAD K.
(Inst. of Nuclear Res., Hungarian Acad. of Sciences (ATOMKI), H-4001 Debrecen P.O. Box 51, HUN)
,
BEKE D. L.
(Dep. of Solid State Physics, Univ. of Debrecen, H-4010 Debrecen P.O. Box 2, HUN)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
97
号:
23
ページ:
233103
発行年:
2010年12月06日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)