文献
J-GLOBAL ID:201002260630823956
整理番号:10A0823253
Schottkyダイオードへの応用を目指したNiを触媒としたシリコンナノワイヤアレイの成長
Ni-catalyzed growth of silicon wire arrays for a Schottky diode
著者 (9件):
JEE Sang-won
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
,
KIM Joondong
(Nano-Mechanical SRC, Korea Inst. of Machinery and Materials, Daejeon 305343, KOR)
,
JUNG Jin-young
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
,
UM Han-don
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
,
MOIZ Syed Abdul
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
,
YOO Bongyoung
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
,
CHO Hyung Koun
(School of Advanced Materials Sci. and Engineering, Sungkyunkwan Univ., Suwon 440746, KOR)
,
PARK Yun Chang
(Measurement and Analysis Div., National Nanofab Center, Daejeon 305806, KOR)
,
LEE Jung-ho
(Dep. of Materials and Chemical Engineering, Hanyang Univ., Ansan 426791, KOR)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
97
号:
4
ページ:
042103
発行年:
2010年07月26日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)