文献
J-GLOBAL ID:201002278973298284
整理番号:10A0322245
高い移動度のコバルトフタロシアニン薄膜におけるバイアスと温度依存性の電荷輸送
Bias and temperature dependent charge transport in high mobility cobalt-phthalocyanine thin films
著者 (8件):
SAMANTA S.
(Technical Physics and Prototype Engineering Div., Bhabha Atomic Res. Center, Mumbai 400 085, IND)
,
ASWAL D. K.
(Res. Inst. of Electronics, 3-5-1 Johoku, Naka-Ku, Hamamatsu 432 8011, JPN)
,
SINGH A.
(Technical Physics and Prototype Engineering Div., Bhabha Atomic Res. Center, Mumbai 400 085, IND)
,
DEBNATH A. K.
(Technical Physics and Prototype Engineering Div., Bhabha Atomic Res. Center, Mumbai 400 085, IND)
,
KUMAR M. Senthil
(Dep. of Physics, Indian Inst. of Technol., Mumbai 400 076, IND)
,
HAYAKAWA Y.
(Res. Inst. of Electronics, 3-5-1 Johoku, Naka-Ku, Hamamatsu 432 8011, JPN)
,
GUPTA S. K.
(Technical Physics and Prototype Engineering Div., Bhabha Atomic Res. Center, Mumbai 400 085, IND)
,
YAKHMI J. V.
(Technical Physics and Prototype Engineering Div., Bhabha Atomic Res. Center, Mumbai 400 085, IND)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
96
号:
1
ページ:
013305
発行年:
2010年01月04日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)