文献
J-GLOBAL ID:201102206178599590
整理番号:11A0857487
(メチルシクロペンタジエニル)トリメチル・プラチナとO2プラスマを用いたAl2O3基板上のPt原子層堆積の核生成と成長
Nucleation and growth of Pt atomic layer deposition on Al2O3 substrates using (methylcyclopentadienyl)-trimethyl platinum and O2 plasma
著者 (8件):
BAKER L.
(Dep. of Chemistry and Biochemistry and Dep. of Chemical and Biological Engineering, Univ. of Colorado, Boulder ...)
,
CAVANAGH A. S.
(Dep. of Chemistry and Biochemistry and Dep. of Chemical and Biological Engineering, Univ. of Colorado, Boulder ...)
,
SEGHETE D.
(Dep. of Chemistry and Biochemistry and Dep. of Chemical and Biological Engineering, Univ. of Colorado, Boulder ...)
,
GEORGE S. M.
(Dep. of Chemistry and Biochemistry and Dep. of Chemical and Biological Engineering, Univ. of Colorado, Boulder ...)
,
MACKUS A. J. M.
(Dep. of Applied Physics, Eindhoven Univ. of Technol., P.O. Box 513, 5600 MB Eindhoven, NLD)
,
KESSELS W. M. M.
(Dep. of Applied Physics, Eindhoven Univ. of Technol., P.O. Box 513, 5600 MB Eindhoven, NLD)
,
LIU Z. Y.
(General Motors Res. and Dev., Honeoye Falls, New York 14472, USA)
,
WAGNER F. T.
(General Motors Res. and Dev., Honeoye Falls, New York 14472, USA)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
109
号:
8
ページ:
084333
発行年:
2011年04月15日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)