文献
J-GLOBAL ID:201102260815228334
整理番号:11A1630189
InAs薄膜からの強烈なテラヘルツ放射
Intense Terahertz Radiation from InAs Thin Films
著者 (7件):
SASA Shigehiko
(Osaka Inst. of Technol., Nanomaterials Microdevices Res. Center, 5-16-1 Ohmiya Asahi-ku, 535-8585, Osaka, JPN)
,
UMINO Shinya
(Osaka Inst. of Technol., Nanomaterials Microdevices Res. Center, 5-16-1 Ohmiya Asahi-ku, 535-8585, Osaka, JPN)
,
ISHIBASHI Yutaro
(Osaka Inst. of Technol., Nanomaterials Microdevices Res. Center, 5-16-1 Ohmiya Asahi-ku, 535-8585, Osaka, JPN)
,
MAEMOTO Toshihiko
(Osaka Inst. of Technol., Nanomaterials Microdevices Res. Center, 5-16-1 Ohmiya Asahi-ku, 535-8585, Osaka, JPN)
,
INOUE Masataka
(Osaka Inst. of Technol., Nanomaterials Microdevices Res. Center, 5-16-1 Ohmiya Asahi-ku, 535-8585, Osaka, JPN)
,
TAKEYA Kei
(Osaka Univ., Inst. of Laser Engineering, 2-6 Yamada-oka, 565-0871, Suita, JPN)
,
TONOUCHI Masayoshi
(Osaka Univ., Inst. of Laser Engineering, 2-6 Yamada-oka, 565-0871, Suita, JPN)
資料名:
Journal of Infrared, Millimeter, and Terahertz Waves
(Journal of Infrared, Millimeter, and Terahertz Waves)
巻:
32
号:
5
ページ:
646-654
発行年:
2011年05月
JST資料番号:
A0436B
ISSN:
1866-6892
資料種別:
逐次刊行物 (A)
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)