文献
J-GLOBAL ID:201102273523779725
整理番号:11A0595143
Al2O3超薄膜の絶縁破壊の電流計測原子間力顕微鏡による研究
Conductive atomic force microscopy studies on dielectric breakdown behavior of ultrathin Al2O3 films
著者 (6件):
GANESAN K.
(Surface and Nanoscience Div., Materials Sci. Group, Indira Gandhi Centre for Atomic Res., Kalpakkam, Tamil Nadu ...)
,
ILANGO S.
(Surface and Nanoscience Div., Materials Sci. Group, Indira Gandhi Centre for Atomic Res., Kalpakkam, Tamil Nadu ...)
,
MARIYAPPAN S.
(Dep. of Electrical Engineering and Computer Sci., South Dakota State Univ., Brookings, South Dakota 57007, USA)
,
BAROUGHI M. Farrokh
(Dep. of Electrical Engineering and Computer Sci., South Dakota State Univ., Brookings, South Dakota 57007, USA)
,
KAMRUDDIN M.
(Surface and Nanoscience Div., Materials Sci. Group, Indira Gandhi Centre for Atomic Res., Kalpakkam, Tamil Nadu ...)
,
TYAGI A. K.
(Surface and Nanoscience Div., Materials Sci. Group, Indira Gandhi Centre for Atomic Res., Kalpakkam, Tamil Nadu ...)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
98
号:
9
ページ:
092902
発行年:
2011年02月28日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)