文献
J-GLOBAL ID:201202234229314694
整理番号:12A1711876
電子ビームリソグラフィーを用いた大きな高さ変動をもつ非平面基板上での高分解能パターン形成
High resolution patterning on nonplanar substrates with large height variation using electron beam lithography
著者 (5件):
RAY Vishva
(Lurie Nanofabrication Facility, Dep. of Electrical Engineering and Computer Sci., Univ. of Michigan, Ann Arbor ...)
,
AIDA Yukinori
(JEOL Ltd., 3-1-2 Musashino, Akishima-shi, Tokyo, Japan 196-8558)
,
FUNAKOSHI Ryo
(JEOL USA, Inc., 11 Dearborn Road, Peabody, Massachusetts 01960)
,
KATO Hitoshi
(JEOL Ltd., 3-1-2 Musashino, Akishima-shi, Tokyo, Japan 196-8558)
,
PANG Stella W.
(Lurie Nanofabrication Facility, Dep. of Electrical Engineering and Computer Sci., Univ. of Michigan, Ann Arbor ...)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
30
号:
6
ページ:
06F303-06F303-7
発行年:
2012年11月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)