文献
J-GLOBAL ID:201202234617510292
整理番号:12A1500699
平均断面歪みに基づく適応Cu微量疲れモデル
An adaptive Cu trace fatigue model based on average cross-section strain
著者 (4件):
FARLEY D.
(CALCE Electronic Products and Systems Consortium, 2181 Martin Hall, Mechanical Engineering Dep., Univ. of Maryland ...)
,
ZHOU Y.
(CALCE Electronic Products and Systems Consortium, 2181 Martin Hall, Mechanical Engineering Dep., Univ. of Maryland ...)
,
DASGUPTA A.
(CALCE Electronic Products and Systems Consortium, 2181 Martin Hall, Mechanical Engineering Dep., Univ. of Maryland ...)
,
DEVRIES J.w.c.
(Philips Res., Electronic Packaging & Thin Film Div., High Tech Campus 7, WDX-3A 0.262, 5656AE Eindhoven, NLD)
資料名:
Microelectronics Reliability
(Microelectronics Reliability)
巻:
52
号:
11
ページ:
2763-2772
発行年:
2012年11月
JST資料番号:
C0530A
ISSN:
0026-2714
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)