文献
J-GLOBAL ID:201202234758340382
整理番号:12A1516035
ダイヤモンドイド被覆によって,10nm空間分解能の化学及び磁気イメージングを行う破壊法が可能となる
Diamondoid coating enables disruptive approach for chemical and magnetic imaging with 10 nm spatial resolution
著者 (15件):
ISHIWATA Hitoshi
(Stanford Inst. for Materials and Energy Sci., Stanford Univ., Stanford, California 94305, USA)
,
ACREMANN Yves
(Swiss Federal Inst. of Technol. Zurich, Lab. for Solid State Physics, 8093 Zuerich, CHE)
,
SCHOLL Andreas
(Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, California 94705, USA)
,
ROTENBERG Eli
(Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, California 94705, USA)
,
HELLWIG Olav
(San Jose Res. Center, Hitachi Global Storage Technologies, San Jose, California 95135, USA)
,
DOBISZ Elizabeth
(San Jose Res. Center, Hitachi Global Storage Technologies, San Jose, California 95135, USA)
,
DORAN Andrew
(Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, California 94705, USA)
,
TKACHENKO Boryslav A.
(Justus-Liebig Univ., Inst. of Organic Chemistry, Heinrich-Buff-Ring 58, D-35293 Giessen, DEU)
,
FOKIN Andrey A.
(Justus-Liebig Univ., Inst. of Organic Chemistry, Heinrich-Buff-Ring 58, D-35293 Giessen, DEU)
,
SCHREINER Peter R.
(Justus-Liebig Univ., Inst. of Organic Chemistry, Heinrich-Buff-Ring 58, D-35293 Giessen, DEU)
,
DAHL Jeremy E. P.
(Stanford Inst. for Materials and Energy Sci., Stanford Univ., Stanford, California 94305, USA)
,
CARLSON Robert M. K.
(Stanford Inst. for Materials and Energy Sci., Stanford Univ., Stanford, California 94305, USA)
,
MELOSH Nick
(Stanford Inst. for Materials and Energy Sci., Stanford Univ., Stanford, California 94305, USA)
,
SHEN Zhi-xun
(Stanford Inst. for Materials and Energy Sci., Stanford Univ., Stanford, California 94305, USA)
,
OHLDAG Hendrik
(SLAC National Accelerator Lab., Stanford Synchrotron Radiation Lab., Menlo Park, California 94025, USA)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
101
号:
16
ページ:
163101-163101-5
発行年:
2012年10月15日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)