文献
J-GLOBAL ID:201202238391386955
整理番号:12A0121645
相互接続へ応用するプラズマ増強原子層蒸着したルテニウム膜のスケーラビリティ
Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
著者 (16件):
SWERTS J.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
ARMINI S.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
CARBONELL L.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
DELABIE A.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
FRANQUET A.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
MERTENS S.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
POPOVICI M.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
SCHAEKERS M.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
WITTERS T.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
TOEKEI Z.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
BEYER G.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
VAN ELSHOCHT S.
(IMEC, Kapeldreef 75, 3001- Leuven, BEL)
,
GRAVEY V.
(Applied Materials Belgium, Kapeldreef 75, 3001- Leuven, BEL)
,
COCKBURN A.
(Applied Materials Belgium, Kapeldreef 75, 3001- Leuven, BEL)
,
SHAH K.
(Applied Materials, Bowers Avenue, California)
,
AUBUCHON J.
(Applied Materials, Bowers Avenue, California)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
30
号:
1
ページ:
01A103
発行年:
2012年01月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)