文献
J-GLOBAL ID:201202240645733752
整理番号:12A1306328
フォトレジストプラズマ改質の実時間測定:プラズマ真空紫外放射とイオンの役割
Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions
著者 (8件):
WEILNBOECK F.
(Dep. of Materials Sci. and Engineering, and Inst. for Res. in Electronics and Applied Physics, Univ. of Maryland ...)
,
KUMAR N.
(Dep. of Materials Sci. and Engineering, and Inst. for Res. in Electronics and Applied Physics, Univ. of Maryland ...)
,
OEHRLEIN G. S.
(Dep. of Materials Sci. and Engineering, and Inst. for Res. in Electronics and Applied Physics, Univ. of Maryland ...)
,
CHUNG T.-y.
(Dep. of Chemical and Biomolecular Engineering, Univ. of California, Berkeley, California 94720)
,
GRAVES D.
(Dep. of Chemical and Biomolecular Engineering, Univ. of California, Berkeley, California 94720)
,
LI M.
(Dow Electronic Materials, 455 Forest Street, Marlborough, Massachusetts 01752)
,
HUDSON E. A.
(Lam Res. Corp., 4650 Cushing Parkway, Fremont, California 94538)
,
BENCK E. C.
(National Inst. of Standards and Technol., Gaithersburg, Maryland 20899)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
30
号:
3
ページ:
031807-031807-12
発行年:
2012年05月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)