文献
J-GLOBAL ID:201202252461580692
整理番号:12A1439731
EUVマスクとEUVL露光ウエハの光学的検査感度最適化に向けて
Towards the Optical Inspection Sensitivity Optimization of EUV Masks and EUVL-Exposed Wafers
著者 (22件):
OKOROANYANWU U.
(GLOBALFOUNDRIES, Dresden, DEU)
,
OKOROANYANWU U.
(AMTC)
,
HEUMANN J.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
ZHU X.
(GLOBALFOUNDRIES, NY, USA)
,
CLIFFORD C.H.
(GLOBALFOUNDRIES, CA, USA)
,
JIANG F.
(GLOBALFOUNDRIES, CA, USA)
,
MANGAT P.
(GLOBALFOUNDRIES, NY, USA)
,
GHASKADAVI R.
(KLA-Tencor, NY, USA)
,
MOHN E.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
MOSES R.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
WOOD O.
(GLOBALFOUNDRIES, NY, USA)
,
ROLFF H.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
SCHEDEL T.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
CANTRELL R.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
NESLADEK P.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
LICAUSI N.
(GLOBALFOUNDRIES, NY, USA)
,
CAI X.
(GLOBALFOUNDRIES, NY, USA)
,
TAYLOR W.
(GLOBALFOUNDRIES, NY, USA)
,
SCHEFSKE J.
(GLOBALFOUNDRIES, NY, USA)
,
SCHEFSKE J.
(IMEC)
,
BENDER M.
(Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU)
,
SCHMIDT N.
(KLA-Tencor, Dresden, DEU)
資料名:
Proceedings of SPIE
(Proceedings of SPIE)
巻:
8352
ページ:
83520V.1-83520V.14
発行年:
2012年
JST資料番号:
D0943A
ISSN:
0277-786X
CODEN:
PSISDG
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)