文献
J-GLOBAL ID:201202264470916987
整理番号:12A0569680
Ta-Nb合金に関する陽極膜の成長及び電場結晶化
Growth and field crystallization of anodic films on Ta-Nb alloys
著者 (8件):
KOMIYAMA S.
(Hokkaido Univ., Div. of Materials Chemistry, Fac. of Engineering, 060-8628, Sapporo, Hokkaido, JPN)
,
TSUJI E.
(Hokkaido Univ., Div. of Materials Chemistry, Fac. of Engineering, 060-8628, Sapporo, Hokkaido, JPN)
,
AOKI Y.
(Hokkaido Univ., Div. of Materials Chemistry, Fac. of Engineering, 060-8628, Sapporo, Hokkaido, JPN)
,
HABAZAKI H.
(Hokkaido Univ., Div. of Materials Chemistry, Fac. of Engineering, 060-8628, Sapporo, Hokkaido, JPN)
,
SANTAMARIA M.
(Universita degli Studi di Palermo, Dipartimento di Ingegneria Chimica dei Processi e dei Materiali, Viale delle ...)
,
QUARTO F.
(Universita degli Studi di Palermo, Dipartimento di Ingegneria Chimica dei Processi e dei Materiali, Viale delle ...)
,
SKELDON P.
(The Univ. of Manchester, Corrosion and Protection Centre, School of Materials, M13 9PL, Manchester, GBR)
,
THOMPSON G. E.
(The Univ. of Manchester, Corrosion and Protection Centre, School of Materials, M13 9PL, Manchester, GBR)
資料名:
Journal of Solid State Electrochemistry
(Journal of Solid State Electrochemistry)
巻:
16
号:
4
ページ:
1595-1604
発行年:
2012年04月
JST資料番号:
W1021A
ISSN:
1432-8488
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)