文献
J-GLOBAL ID:201202264593415141
整理番号:12A1718426
eビームリソグラフィにより作製した高性能回折格子
High performance diffraction gratings made by e-beam lithography
著者 (8件):
ZEITNER Uwe D.
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
ZEITNER Uwe D.
(Friedrich-Schiller-University Jena, Inst. for Applied Physics, Max Wien Platz 1, 07743, Jena, DEU)
,
OLIVA Maria
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
FUCHS Frank
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
MICHAELIS Dirk
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
BENKENSTEIN Tino
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
HARZENDORF Torsten
(Fraunhofer Inst. for Applied Optics & Precision Engineering, Albert-Einstein-Str. 7, 07745, Jena, DEU)
,
KLEY Ernst-Bernhard
(Friedrich-Schiller-University Jena, Inst. for Applied Physics, Max Wien Platz 1, 07743, Jena, DEU)
資料名:
Applied Physics. A. Materials Science & Processing
(Applied Physics. A. Materials Science & Processing)
巻:
109
号:
4
ページ:
789-796
発行年:
2012年12月
JST資料番号:
D0256C
ISSN:
0947-8396
CODEN:
APHYCC
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)