文献
J-GLOBAL ID:201202266924047884
整理番号:12A1311542
DC反応性マグネトロンスパッタリングにより作製された酸化アルミニウム膜の構造及び特性に及ぼす負基板バイアス電圧の効果
Effects of negative substrate bias voltage on the structure and properties of aluminum oxide films prepared by DC reactive magnetron sputtering
著者 (6件):
TANG Xiufeng
(State Key Lab. of Solidification Processing, School of Materials Sci. and Engineering, Northwestern Polytechnical ...)
,
LUO Fa
(State Key Lab. of Solidification Processing, School of Materials Sci. and Engineering, Northwestern Polytechnical ...)
,
OU Fang
(Dep. of Electrical Engineering and Computer Sci., Northwestern Univ., Evanston, IL 60208, USA)
,
ZHOU Wancheng
(State Key Lab. of Solidification Processing, School of Materials Sci. and Engineering, Northwestern Polytechnical ...)
,
ZHU Dongmei
(State Key Lab. of Solidification Processing, School of Materials Sci. and Engineering, Northwestern Polytechnical ...)
,
HUANG Zhibin
(State Key Lab. of Solidification Processing, School of Materials Sci. and Engineering, Northwestern Polytechnical ...)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
259
ページ:
448-453
発行年:
2012年10月15日
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)