文献
J-GLOBAL ID:201202271858048851
整理番号:12A1754196
PおよびN型Bi2Te3膜の熱電特性に対するスパッタリング処理パラメータの効果
Effect of Sputtering Process Parameters on the Thermoelectric Properties of P and N-type Bi2Te3 Films
著者 (10件):
ARINA
(Republic Polytechnic, SGP)
,
CHOW Hui Fan Shermin
(Republic Polytechnic, SGP)
,
BARI Shamira Banu Abdul
(Republic Polytechnic, SGP)
,
LIN Chia Ai
(Republic Polytechnic, SGP)
,
KO San Ye
(Republic Polytechnic, SGP)
,
KHONG Samuel
(Republic Polytechnic, SGP)
,
SIM Jonathan
(Republic Polytechnic, SGP)
,
EZHILVALAVAN S.
(Republic Polytechnic, SGP)
,
MA Jan
(Nanyang Technological Univ., SGP)
,
HOON Heng Hui
(Nanyang Technological Univ., SGP)
資料名:
Diffusion and Defect Data Part B. Solid State Phenomena
(Diffusion and Defect Data Part B. Solid State Phenomena)
巻:
185
ページ:
94-98
発行年:
2012年
JST資料番号:
T0583A
ISSN:
1012-0394
資料種別:
逐次刊行物 (A)
発行国:
スイス (CHE)
言語:
英語 (EN)