文献
J-GLOBAL ID:201202279909129852
整理番号:12A0337509
H2O雰囲気中での反応性スパッタリングで作成した水化ZrO2薄膜のイオン伝導率におよぼす基板温度の効果
Effects of substrate temperature on the ion conductivity of hydrated ZrO2 thin films prepared by reactive sputtering in H2O atmosphere
著者 (7件):
LI Ning
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
SUZUKI Miki
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
ABE Yoshio
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
KAWAMURA Midori
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
SASAKI Katsutaka
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
ITOH Hidenobu
(Dep. of Materials Sci. and Engineering, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
,
SUZUKI Tsutomu
(Dep. of Biotechnology and Environmental Chemistry, Kitami Inst. of Technol., Kitami, Hokkaido 090-8507, JPN)
資料名:
Solar Energy Materials and Solar Cells
(Solar Energy Materials and Solar Cells)
巻:
99
ページ:
160-165
発行年:
2012年04月
JST資料番号:
D0513C
ISSN:
0927-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)