文献
J-GLOBAL ID:201202291826846269
整理番号:12A1450538
Si(100)上のエピタキシャルSi1-xGex層のマイクロ波長マイクロRaman特性評価とインラインプロセスモニタリングへの適用
Multiwavelength Micro-Raman Characterization of Epitaxial Si1-xGex Layers on Si(100) and In-Line Process Monitoring Applications
著者 (11件):
CHANG Chun-Wei
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
HONG Min-Hao
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
TSAI Ming-Shan
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
LEE Kuan-Ching
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
LEE Wei-Fan
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
CHUANG Yen
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
FAN Yu-Ta
(Taiwan Semiconductor Manufacturing Co., Ltd., 8, Li-Hsin Rd. 6, Hsinchu Sci. Park, 300-77, Hsinchu, Taiwan)
,
UEDA Takeshi
(WaferMasters, Inc., 246 East Gish Road, 95112, San Jose, CA, USA)
,
ISHIGAKI Toshikazu
(WaferMasters, Inc., 246 East Gish Road, 95112, San Jose, CA, USA)
,
KANG Kitaek
(WaferMasters, Inc., 246 East Gish Road, 95112, San Jose, CA, USA)
,
YOO Woo Sik
(WaferMasters, Inc., 246 East Gish Road, 95112, San Jose, CA, USA)
資料名:
Journal of Electronic Materials
(Journal of Electronic Materials)
巻:
41
号:
11
ページ:
3125-3129
発行年:
2012年11月
JST資料番号:
D0277B
ISSN:
0361-5235
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)