文献
J-GLOBAL ID:201202298281478130
整理番号:12A0593151
気相成長チオフェン/フェニレンコオリゴマ膜の熱処理の最適化
Optimization of thermal treatment of vapor-deposited thiophene/phenylene co-oligomer films
著者 (6件):
MOCHIZUKI Hiroyuki
(Electronics and Photonics Res. Institutes, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki ...)
,
KAWAGUCHI Yoshizo
(Electronics and Photonics Res. Institutes, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki ...)
,
SASAKI Fumio
(Electronics and Photonics Res. Institutes, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki ...)
,
CHIKAMATSU Masayuki
(Electronics and Photonics Res. Institutes, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki ...)
,
AZUMI Reiko
(Electronics and Photonics Res. Institutes, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki ...)
,
HOTTA Shu
(Dep. of Macromolecular Sci. and Engineering, Graduate School of Sci. and Technol., Kyoto Inst. of Technol., Kyoto ...)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
345
号:
1
ページ:
39-43
発行年:
2012年04月15日
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)