文献
J-GLOBAL ID:201302233712776373
整理番号:13A1156545
負イオンを有するVHF SiH4/H2プラズマ特性
VHF SiH4/H2 plasma characteristics with negative ions
著者 (8件):
YAMANE Tsukasa
(Solar Power Dep., Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, JPN)
,
NAKAO Sachiko
(Solar Power Dep., Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, JPN)
,
TAKEUCHI Yoshiaki
(Solar Power Dep., Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, JPN)
,
YAMAUCHI Yasuhiro
(Solar Power Dep., Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, JPN)
,
TAKATSUKA Hiromu
(Solar Power Dep., Mitsubishi Heavy Industries Ltd., Isahaya, Nagasaki, 854-0065, JPN)
,
MUTA Hiroshi
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu Univ., Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, JPN)
,
UCHINO Kiichiro
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu Univ., Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, JPN)
,
KAWAI Yoshinobu
(Interdisciplinary Graduate School of Engineering Sciences, Kyushu Univ., Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, JPN)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
228
号:
Supplement 1
ページ:
S433-S436
発行年:
2013年08月15日
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)