文献
J-GLOBAL ID:201302251517539144
整理番号:13A1439784
化学機械的平坦化による六方晶系SiC(0001)の原子ステップテラス構造の拡張研究
Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization
著者 (10件):
SHI Xiaolei
(The State Key Lab. of Tribology, Tsinghua Univ., Beijing 100084, CHN)
,
SHI Xiaolei
(Shenzhen Key Lab. of Micro/Nano Manufacturing, Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen 518057, CHN)
,
PAN Guoshun
(The State Key Lab. of Tribology, Tsinghua Univ., Beijing 100084, CHN)
,
PAN Guoshun
(Shenzhen Key Lab. of Micro/Nano Manufacturing, Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen 518057, CHN)
,
ZHOU Yan
(The State Key Lab. of Tribology, Tsinghua Univ., Beijing 100084, CHN)
,
ZHOU Yan
(Shenzhen Key Lab. of Micro/Nano Manufacturing, Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen 518057, CHN)
,
ZOU Chunli
(The State Key Lab. of Tribology, Tsinghua Univ., Beijing 100084, CHN)
,
ZOU Chunli
(Shenzhen Key Lab. of Micro/Nano Manufacturing, Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen 518057, CHN)
,
GONG Hua
(The State Key Lab. of Tribology, Tsinghua Univ., Beijing 100084, CHN)
,
GONG Hua
(Shenzhen Key Lab. of Micro/Nano Manufacturing, Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen 518057, CHN)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
284
ページ:
195-206
発行年:
2013年11月01日
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)