文献
J-GLOBAL ID:201302258563240190
整理番号:13A1749633
酸性スラリー中に酸化剤としてKClO4を使用したアモルファスGe2Sb2Te2の化学機械平坦化
Chemical Mechanical Planarization of Amorphous Ge2Sb2Te5 using KClO4 as oxidizer in Acidic Slurry
著者 (12件):
HE Aodong
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
HE Aodong
(Graduate Univ., Chinese Acad. Sci., Beijing, CHN)
,
SONG Zhitang
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
BO Liu
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
ZHONG Min
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
LIU Weili
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
WANG Liangyong
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
YAN Weixia
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
YAN Weixia
(Graduate Univ., Chinese Acad. Sci., Beijing, CHN)
,
LEI Yu
(Shanghai Inst. Microsystem and Information Technol., Chinese Acad. Sci., Shanghai, CHN)
,
LEI Yu
(Graduate Univ., Chinese Acad. Sci., Beijing, CHN)
,
WU Guanping
(Semiconductor Manufacturing International Corp., Shanghai)
資料名:
Proceedings of SPIE
(Proceedings of SPIE)
巻:
8782
ページ:
87820Y.1-87820Y.6
発行年:
2013年
JST資料番号:
D0943A
ISSN:
0277-786X
CODEN:
PSISDG
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)