文献
J-GLOBAL ID:201302262801912612
整理番号:13A1812899
平坦欠陥無し表面を自動取得するためのon-axis Si面6H-SiCウエハの化学機械研磨(CMP)
Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface
著者 (12件):
PAN Guoshun
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
PAN Guoshun
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
,
ZHOU Yan
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
ZHOU Yan
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
,
LUO Guihai
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
LUO Guihai
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
,
SHI Xiaolei
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
SHI Xiaolei
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
,
ZOU Chunli
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
ZOU Chunli
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
,
GONG Hua
(Tsinghua Univ., State Key Lab. of Tribology, 100084, Beijing, CHN)
,
GONG Hua
(Res. Inst. of Tsinghua Univ. in Shenzhen, Shenzhen Key Lab. of Micro/Nano Manufacturing, 518057, Shenzhen, CHN)
資料名:
Journal of Materials Science. Materials in Electronics
(Journal of Materials Science. Materials in Electronics)
巻:
24
号:
12
ページ:
5040-5047
発行年:
2013年12月
JST資料番号:
W0003A
ISSN:
0957-4522
CODEN:
JMTSAS
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)