文献
J-GLOBAL ID:201302266657563620
整理番号:13A1944148
a-Si:H/c-Siヘテロ接合太陽電池のための高透過率及び高仕事関数のRFマグネトロンスパッタリング作製酸化インジウム錫薄膜
RF magnetron sputtered indium tin oxide films with high transmittance and work function for a-Si:H/c-Si heterojunction solar cells
著者 (9件):
HUSSAIN Shahzada Qamar
(Dep. of Energy Sci., Sungkyunkwan Univ., Suwon 440-746, KOR)
,
HUSSAIN Shahzada Qamar
(Dep. of Physics, COMSATS Inst. of Information and Technol., Lahore 54000, PAK)
,
OH Woong-kyo
(Coll. of Information and Communication Engineering, Sungkyunkwan Univ., Suwon 440-746, KOR)
,
AHN Shihyun
(Coll. of Information and Communication Engineering, Sungkyunkwan Univ., Suwon 440-746, KOR)
,
LE Anh Huy Tuan
(Coll. of Information and Communication Engineering, Sungkyunkwan Univ., Suwon 440-746, KOR)
,
KIM Sunbo
(Dep. of Energy Sci., Sungkyunkwan Univ., Suwon 440-746, KOR)
,
LEE Youngseok
(Dep. of Energy Sci., Sungkyunkwan Univ., Suwon 440-746, KOR)
,
YI Junsin
(Dep. of Energy Sci., Sungkyunkwan Univ., Suwon 440-746, KOR)
,
YI Junsin
(Coll. of Information and Communication Engineering, Sungkyunkwan Univ., Suwon 440-746, KOR)
資料名:
Vacuum
(Vacuum)
巻:
101
ページ:
18-21
発行年:
2014年03月
JST資料番号:
E0347A
ISSN:
0042-207X
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
イギリス (GBR)
言語:
英語 (EN)