文献
J-GLOBAL ID:201302277432462524
整理番号:13A1744783
無電解Ni-Pその場析出と後アニーリングにおよぼす静磁場の効果
The Effect of Static Magnetic Field on Electroless Ni-P In Situ Deposition and Post-annealing
著者 (6件):
LYU Xiao
(Shenyang Ligong Univ., School of Materials Sci. and Engineering, No. 6 Nanping Central Road, 110159, Shenyang ...)
,
LI Donggang
(Northeastern Univ., Key Lab. of Electromagnetic Processing of Materials (Ministry of Education), No. 3-11 Wenhua ...)
,
WANG Qiang
(Northeastern Univ., Key Lab. of Electromagnetic Processing of Materials (Ministry of Education), No. 3-11 Wenhua ...)
,
WANG Kai
(Northeastern Univ., Key Lab. of Electromagnetic Processing of Materials (Ministry of Education), No. 3-11 Wenhua ...)
,
LOU Changsheng
(Shenyang Ligong Univ., School of Materials Sci. and Engineering, No. 6 Nanping Central Road, 110159, Shenyang ...)
,
HE Jicheng
(Northeastern Univ., Key Lab. of Electromagnetic Processing of Materials (Ministry of Education), No. 3-11 Wenhua ...)
資料名:
Journal of Materials Engineering and Performance
(Journal of Materials Engineering and Performance)
巻:
22
号:
10
ページ:
3134-3139
発行年:
2013年10月
JST資料番号:
C0161B
ISSN:
1059-9495
CODEN:
JMEPEG
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)