文献
J-GLOBAL ID:201302283408471385
整理番号:13A1272001
近接場光ナノリソグラフィーのための高精度動的アラインメント及びギャップ制御
High precision dynamic alignment and gap control for optical near-field nanolithography
著者 (5件):
WEN Xiaolei
(School of Mechanical Engineering and Birck Nanotechnology Center, Purdue Univ., West Lafayette, Indiana 47906 and ...)
,
TRAVERSO Luis M.
(School of Mechanical Engineering and Birck Nanotechnology Center, Purdue Univ., West Lafayette, Indiana 47906)
,
SRISUNGSITTHISUNTI Pornsak
(School of Mechanical Engineering and Birck Nanotechnology Center, Purdue Univ., West Lafayette, Indiana 47906)
,
XU Xianfan
(School of Mechanical Engineering and Birck Nanotechnology Center, Purdue Univ., West Lafayette, Indiana 47906)
,
MOON Euclid E.
(Dep. of Electrical Engineering and Computer Sci., Massachusetts Inst. of Technol., Cambridge, Massachusetts 02139)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
31
号:
4
ページ:
041601-041601-5
発行年:
2013年07月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)