文献
J-GLOBAL ID:201302291351152671
整理番号:13A0235823
太陽電池応用のための誘導結合プラズマによって低温堆積されたSiNx:H薄膜
Low temperature SiN x :H films deposited by inductively coupled plasma for solar cell applications
著者 (7件):
ZHOU H.p.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
WEI D.y.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
XU L.x.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
GUO Y.n.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
XIAO S.q.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
HUANG S.y.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
,
XU S.
(Plasma Sources and Application Center, NIE, and Inst. of Advanced Studies, Nanyang Technological Univ., 637616, SGP)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
264
ページ:
21-26
発行年:
2013年01月01日
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)