文献
J-GLOBAL ID:201502207559394770
整理番号:15A1368316
高マンガンシリサイドMn4Si7薄膜の超高真空蒸着
Ultrahigh vacuum deposition of higher manganese silicide Mn4Si7 thin films
著者 (4件):
DULAL Rajendra P.
(Dep. of Physics, The Catholic Univ. of America, Washington, DC 20064 and The Vitreous State Lab., The Catholic Univ. ...)
,
DAHAL Bishnu R.
(Dep. of Physics, The Catholic Univ. of America, Washington, DC 20064 and The Vitreous State Lab., The Catholic Univ. ...)
,
PEGG Ian L.
(Dep. of Physics, The Catholic Univ. of America, Washington, DC 20064 and The Vitreous State Lab., The Catholic Univ. ...)
,
PHILIP John
(Dep. of Physics, The Catholic Univ. of America, Washington, DC 20064 and The Vitreous State Lab., The Catholic Univ. ...)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
33
号:
6
ページ:
060603-060603-3
発行年:
2015年11月
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)