文献
J-GLOBAL ID:201502207665660641
整理番号:15A0909386
キャリア極性制御Fe3-xTixO4半導体薄膜のスピングラス挙動
Spin-glass behaviors in carrier polarity controlled Fe3- xTixO4 semiconductor thin films
著者 (8件):
YAMAHARA H.
(Inst. of Engineering Innovation, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo ...)
,
SEKI M.
(Dep. of Electrical Engineering and Information Systems, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo ...)
,
ADACHI M.
(Dep. of Electrical Engineering and Information Systems, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo ...)
,
TAKAHASHI M.
(Dep. of Electrical Engineering and Information Systems, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo ...)
,
NASU H.
(Dep. of Electrical Engineering and Information Systems, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo ...)
,
HORIBA K.
(KEK, Photon Factory, Tsukuba, Ibaraki 305-0801, JPN)
,
KUMIGASHIRA H.
(KEK, Photon Factory, Tsukuba, Ibaraki 305-0801, JPN)
,
TABATA H.
(Dep. of Electrical Engineering and Information Systems, Graduate School of Engineering, Univ. of Tokyo, 7-3-1 Hongo ...)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
118
号:
6
ページ:
063905-063905-7
発行年:
2015年08月14日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)