文献
J-GLOBAL ID:201502212664511255
整理番号:15A1140538
ハイブリッドナノインプリントソフトリソグラフィーに基づく近ゼロ残留層ナノインプリント
Near-zero-residual layer nanoimprint based on hybrid nanoimprint soft lithography
著者 (7件):
CUI Yushuang
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
LU Jingjun
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
FU Xinxin
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
BIAN Jie
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
YUAN Changsheng
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
GE Haixiong
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
,
CHEN Yanfeng
(Nanjing Univ., Dep. of Materials Sci. and Engineering, Coll. of Engineering and Applied Sciences, National Lab. of ...)
資料名:
Applied Physics. A. Materials Science & Processing
(Applied Physics. A. Materials Science & Processing)
巻:
121
号:
2
ページ:
371-375
発行年:
2015年11月
JST資料番号:
D0256C
ISSN:
0947-8396
CODEN:
APHYCC
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)