文献
J-GLOBAL ID:201502212997151701
整理番号:15A1321078
直流マグネトロンスパッタリングで調整した,Mo-Al-Si-N薄膜の構造と機械的性質とに及ぼす窒素流率の効果
Effect of nitrogen flow rate on structure and mechanical properties of Mo-Al-Si-N films prepared by direct current magnetron sputtering
著者 (6件):
YUAN Zhigang
(School of Mechanical Engineering and Automation, Wuhan textile Univ., Wuhan 430073, CHN)
,
SUN Li
(School of Mechanical Engineering and Automation, Wuhan textile Univ., Wuhan 430073, CHN)
,
FANG Qianfeng
(Key Lab. of Materials Physics, Inst. of Solid State Physics, Chinese Acad. of Sciences, Hefei 230031, CHN)
,
GONG Wenbang
(School of Mechanical Engineering and Automation, Wuhan textile Univ., Wuhan 430073, CHN)
,
WU Xiao
(School of Mechanical Engineering and Automation, Wuhan textile Univ., Wuhan 430073, CHN)
,
XU Zili
(School of Mechanical Engineering and Automation, Wuhan textile Univ., Wuhan 430073, CHN)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
594
号:
PA
ページ:
18-23
発行年:
2015年11月02日
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
オランダ (NLD)
言語:
英語 (EN)