文献
J-GLOBAL ID:201502215936337674
整理番号:15A0804416
中間周波数マグネトロンスパッタリングによるチタン合金基板上でのc軸配向AlN薄膜の成長
Growth of c-axis oriented AlN thin films on titanium alloy substrate by middle frequency magnetron sputtering
著者 (6件):
JIANG Jianying
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
,
PENG Bin
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
,
ZHANG Wanli
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
,
WANG Yu
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
,
SHU Lin
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
,
WANG Rui
(State Key Lab. of Electronic Thin Films and Integrated Devices, Univ. of Electronic Sci. and Technol. of China ...)
資料名:
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films
(Journal of Vacuum Science & Technology. A. Vacuum, Surfaces and Films)
巻:
33
号:
4
ページ:
041509-041509-6
発行年:
2015年07月
JST資料番号:
C0789B
ISSN:
0734-2101
CODEN:
JVTAD6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)