文献
J-GLOBAL ID:201502219778625157
整理番号:15A0530265
異なる表面トポグラフィーのシラン化シリコンウエハ上の準静的接触角の傾斜板測定の過程での高精度液滴形状解析(HPDSA):接触角力学への表面粗度の影響
High-precision drop shape analysis (HPDSA) of quasistatic contact angles on silanized silicon wafers with different surface topographies during inclining-plate measurements: Influence of the surface roughness on the contact line dynamics
著者 (8件):
HEIB F.
(Dep. of Physical Chemistry, Saarland Univ., 66123 Saarbruecken, DEU)
,
HEMPELMANN R.
(Dep. of Physical Chemistry, Saarland Univ., 66123 Saarbruecken, DEU)
,
MUNIEF W.M.
(Dep. of Informatics and Microsystem Technol., Univ. of Applied Sciences, Kaiserslautern, 66482 Zweibruecken, DEU)
,
INGEBRANDT S.
(Dep. of Informatics and Microsystem Technol., Univ. of Applied Sciences, Kaiserslautern, 66482 Zweibruecken, DEU)
,
FUG F.
(Dep. of Adhesion and Interphases in Polymers, Saarland Univ., 66123 Saarbruecken, DEU)
,
POSSART W.
(Dep. of Adhesion and Interphases in Polymers, Saarland Univ., 66123 Saarbruecken, DEU)
,
GROSS K.
(Dep. of Physical Chemistry, Saarland Univ., 66123 Saarbruecken, DEU)
,
SCHMITT M.
(Dep. of Physical Chemistry, Saarland Univ., 66123 Saarbruecken, DEU)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
342
ページ:
11-25
発行年:
2015年07月01日
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)