文献
J-GLOBAL ID:201502275785607099
整理番号:15A0497554
NiCuZnフェライトのDCバイアス重合せ特性に及ぼすSiO2濃度の影響
Effects of SiO2 concentration on the DC-bias-superposition characteristics of the NiCuZn ferrites
著者 (5件):
HUAN Li
(Univ. of Electronic Sci. and Technol. of China, State Key Lab. of Electronic Thin Films and Integrated Devices ...)
,
TANG Xiaoli
(Univ. of Electronic Sci. and Technol. of China, State Key Lab. of Electronic Thin Films and Integrated Devices ...)
,
SU Hua
(Univ. of Electronic Sci. and Technol. of China, State Key Lab. of Electronic Thin Films and Integrated Devices ...)
,
ZHANG Huaiwu
(Univ. of Electronic Sci. and Technol. of China, State Key Lab. of Electronic Thin Films and Integrated Devices ...)
,
JING Yulan
(Univ. of Electronic Sci. and Technol. of China, State Key Lab. of Electronic Thin Films and Integrated Devices ...)
資料名:
Journal of Materials Science. Materials in Electronics
(Journal of Materials Science. Materials in Electronics)
巻:
26
号:
5
ページ:
3275-3281
発行年:
2015年05月
JST資料番号:
W0003A
ISSN:
0957-4522
CODEN:
JMTSAS
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)