文献
J-GLOBAL ID:201502279233269305
整理番号:15A0228738
rfスパッタしたSnOx薄膜の特性に対する急速熱アニール温度の影響
Influence of rapid-thermal-annealing temperature on properties of rf-sputtered SnO thin films
著者 (9件):
JIANG Yu-Hao
(Graduate Inst. of Applied Mechanics, National Taiwan Univ., Taipei 10617, Taiwan)
,
CHIU I-Chung
(Graduate Inst. of Photonics and Optoelectronics & Dep. of Electrical Engineering, National Taiwan Univ., Taipei ...)
,
KAO Peng-Kai
(Dep. of Chemical Engineering, National Taiwan Univ., Taipei 10617, Taiwan)
,
HE Jyun-Ci
(Graduate Inst. of Photonics and Optoelectronics & Dep. of Electrical Engineering, National Taiwan Univ., Taipei ...)
,
WU Yu-Han
(Materials and Chemical Res. Laboratories, Industrial Technol. Res. Inst., Chutung 31040, Taiwan)
,
YANG Yao-Jhen
(Dep. of Chemical Engineering, National Taiwan Univ., Taipei 10617, Taiwan)
,
HSU Cheng-Che
(Dep. of Chemical Engineering, National Taiwan Univ., Taipei 10617, Taiwan)
,
CHENG I-Chun
(Graduate Inst. of Photonics and Optoelectronics & Dep. of Electrical Engineering, National Taiwan Univ., Taipei ...)
,
CHEN Jian-Zhang
(Graduate Inst. of Applied Mechanics, National Taiwan Univ., Taipei 10617, Taiwan)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
327
ページ:
358-363
発行年:
2015年02月01日
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)