文献
J-GLOBAL ID:201602209123896312
整理番号:16A0118518
イオンビームスパッタリング堆積による,ニッケルホイル上の大粒径単結晶六方晶系窒化ホウ素分域の合成
Synthesis of Large-Sized Single-Crystal Hexagonal Boron Nitride Domains on Nickel Foils by Ion Beam Sputtering Deposition
著者 (9件):
WANG Haolin
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
ZHANG Xingwang
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
LIU Heng
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
YIN Zhigang
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
MENG Junhua
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
XIA Jing
(Key Lab of Photochemical Conversion and Optoelectronic Materials, Technical Inst. of Physics and Chemistry, Chinese ...)
,
MENG Xiang-Min
(Key Lab of Photochemical Conversion and Optoelectronic Materials, Technical Inst. of Physics and Chemistry, Chinese ...)
,
WU Jinliang
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
,
YOU Jingbi
(Key Lab of Semiconductor Materials Sci., Inst. of Semiconductors, Chinese Acad. of Sciences, Beijing, 100083, CHN)
資料名:
Advanced Materials
(Advanced Materials)
巻:
27
号:
48
ページ:
8109-8115
発行年:
2015年12月
JST資料番号:
W0001A
ISSN:
0935-9648
CODEN:
ADVMEW
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
ドイツ (DEU)
言語:
英語 (EN)