文献
J-GLOBAL ID:201602214985349580
整理番号:13A0523276
Effects of Sputtering Pressure and Substrate Temperature on Structure and Optical Absorption Properties of Si1-xGex Thin Films
著者 (7件):
Liu Yani
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Yu Le
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Li Ziquan
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Liu Jinsong
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Cao An
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Jiang Weina
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
,
Liu Jianning
(Coll. of Material Sci. and Technol.,Nanjing Univ. of Aeronautics and Astronautics, Nanjing)
資料名:
Jixie Gongcheng Cailiao
(Jixie Gongcheng Cailiao)
巻:
36
号:
2
ページ:
32-36
発行年:
2012年
JST資料番号:
C2051A
ISSN:
1000-3738
CODEN:
JGCAEL
資料種別:
逐次刊行物 (A)
発行国:
中国 (CHN)
言語:
中国語 (ZH)