文献
J-GLOBAL ID:201602219376443327
整理番号:13A1254053
An advanced alkaline slurry for barrier chemical mechanical planarization on patterned wafers
著者 (6件):
Wang Chenwei
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
,
Liu Yuling
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
,
Niu Xinhuan
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
,
Tian Jianying
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
,
Gao Baohong
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
,
Zhang Xiaoqiang
(Inst. of Microelectronics, Hebei Univ. of Technol., Tianjin)
資料名:
Journal of Semiconductors
(Journal of Semiconductors)
巻:
33
号:
4
ページ:
046001-1-046001-4
発行年:
2012年
JST資料番号:
C2377A
ISSN:
1674-4926
資料種別:
逐次刊行物 (A)
発行国:
中国 (CHN)
言語:
英語 (EN)