文献
J-GLOBAL ID:201602246539002360
整理番号:16A0539193
TiO2アナターゼ[101]表面でのヒ素(III)およびヒ素(IV)の吸着に及ぼすpHの影響
The effect of pH on the adsorption of arsenic(III) and arsenic(V) at the TiO2 anatase [101] surface
著者 (8件):
Wei Zhigang
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
,
Liang Kai
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
,
Wu Yang
(College of Chemistry, Liaoning University, Shenyang 110036, PR China)
,
Zou Yandi
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
,
Zuo Junhui
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
,
Arriagada Diego Cortes
(Laboratorio de Quimica Teorica-Computacional, Departamento de Quimica-Fisica, Pontificia Universidad Catolica de Chile, Chile)
,
Pan Zhanchang
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
,
Hu Guanghui
(School of Chemical Engineering and Light Industry, Guangdong University of Technology, Guangzhou 510006, PR China)
資料名:
Journal of Colloid and Interface Science
(Journal of Colloid and Interface Science)
巻:
462
ページ:
252-259
発行年:
2016年01月15日
JST資料番号:
C0279A
ISSN:
0021-9797
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)