文献
J-GLOBAL ID:201602255327133995
整理番号:16A1098538
SiO_2/SiとSi_3N_4/SiO_2/Siのナノ界面の屈折率と界面状態に関する実験的および計算機による研究【Powered by NICT】
Experimental and computational studies on the refractive index and interface state for nano interface of SiO2/Si and Si3N4/SiO2/Si
著者 (6件):
Rong Li-mei
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
,
Liu Bo
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
,
Meng Zhi-jun
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
,
Liu Kui
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
,
Yu Qi
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
,
Liu Yang
(School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu, China)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2016
号:
INEC
ページ:
1-2
発行年:
2016年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)