文献
J-GLOBAL ID:201602259719608576
整理番号:16A0952774
紫外照射下でのAmorphous-Indium-Gallium-Zinc-オキシド薄膜トランジスタの電気的不安定性【Powered by NICT】
Electrical Instability of Amorphous-Indium-Gallium-Zinc-Oxide Thin-Film Transistors under Ultraviolet Illumination
著者 (7件):
Tang Lanfeng
(School of Electronic Science and Engineering, Nanjing University)
,
Lu Hai
(School of Electronic Science and Engineering, Nanjing University)
,
Ren Fangfang
(School of Electronic Science and Engineering, Nanjing University)
,
Zhou Dong
(School of Electronic Science and Engineering, Nanjing University)
,
Zhang Rong
(School of Electronic Science and Engineering, Nanjing University)
,
Zheng Youdou
(School of Electronic Science and Engineering, Nanjing University)
,
Huang Xiaoming
(Peter Grunberg Research Center, Nanjing University of Posts and Telecommunications)
資料名:
Chinese Physics Letters
(Chinese Physics Letters)
巻:
33
号:
3
ページ:
038502-1-038502-4
発行年:
2016年
JST資料番号:
W1191A
ISSN:
0256-307X
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
中国 (CHN)
言語:
英語 (EN)