文献
J-GLOBAL ID:201602264266910064
整理番号:16A0819022
高出力密度はダイオードレーザの放熱の積層構造の熱分析【JST・京大機械翻訳】
Thermal Analysis of High Power Density Laser Diode Stack Cooling Structure
著者 (6件):
Jing Hongqi
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
,
Zhong Li
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
,
Ni Yuxi
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
,
Zhang Junjie
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
,
Liu Suping
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
,
Ma Xiaoyu
(National Engineering Research Center for Optoelectronic Devices, Institute of Semiconductors, Chinese Academy of Sciences)
資料名:
Faguang Xuebao
(Faguang Xuebao)
巻:
37
号:
1
ページ:
81-87
発行年:
2016年
JST資料番号:
W1380A
ISSN:
1000-7032
CODEN:
FAXUEW
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
中国 (CHN)
言語:
中国語 (ZH)