文献
J-GLOBAL ID:201602268016328627
整理番号:16A0614857
HVMリソグラフィーのための250W EUV光源の開発【Powered by NICT】
Development of 250W EUV light source for HVM lithography
著者 (15件):
Mizoguchi Hakaru
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Nakarai Hiroaki
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Abe Tamotsu
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Nowak Krzysztof M
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Kawasuji Yasufumi
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Tanaka Hiroshi
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Watanabe Yukio
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Hori Tsukasa
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Kodama Takeshi
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Shiraishi Yutaka
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Yanagida Tatsuya
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Yamada Tsuyoshi
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Yamazaki Taku
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Okazaki Shinji
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
,
Saitou Takashi
(Gigaphoton Inc. Hiratsuka facility:3-25-1 Shinomiya Hiratsuka Kanagawa, 254-8567, Japan)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2016
号:
CSTIC
ページ:
1-4
発行年:
2016年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)