文献
J-GLOBAL ID:201602279434173492
整理番号:16A0653154
FO WLPのための超厚フォトレジスト【Powered by NICT】
Ultra thick photo resist for FO-WLP
著者 (6件):
Satou Keiichi
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
,
Katsurayama Makoto
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
,
Hiro Akito
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
,
Sakakibara Hirokazu
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
,
Okamoto Kenji
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
,
Hasegawa Koichi
(Device Integration Materials Laboratory, Fine Electronic Materials Research Laboratories, Yokkaichi Research Center, JSR Corporation, 100, Kawajiri-cho, Mie, 510-8552, Japan)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2016
号:
ICEP
ページ:
562-566
発行年:
2016年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)