文献
J-GLOBAL ID:201602289586749171
整理番号:16A1348152
AlGaN/GaNと格子整合InAlN/GaNヘテロ構造Schottky障壁ダイオードの電気特性の比較
Comparison of electrical characteristics between AlGaN/GaN and lattice-matched InAlN/GaN heterostructure Schottky barrier diodes
著者 (5件):
Ren Jian
(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Yan Dawei
(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Zhai Yang
(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Mou Wenjie
(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
,
Gu Xiaofeng
(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education), Department of Electronic Engineering, Jiangnan University, Wuxi 214122, China)
資料名:
Microelectronics Reliability
(Microelectronics Reliability)
巻:
61
ページ:
82-86
発行年:
2016年06月
JST資料番号:
C0530A
ISSN:
0026-2714
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)