文献
J-GLOBAL ID:201702210155309097
整理番号:17A1560569
比較的高い自己バイアスでのRF PECVD法で蒸着したシリコンの高濃度の炭素被覆【Powered by NICT】
Carbon coatings with high concentrations of silicon deposited by RF PECVD method at relatively high self-bias
著者 (10件):
Jedrzejczak A.
(Lodz University of Technology, Institute Materials Science and Engineering, 1/15, Stefanowskiego, 90-924 Lodz, Poland)
,
Batory D.
(Lodz University of Technology, Institute Materials Science and Engineering, 1/15, Stefanowskiego, 90-924 Lodz, Poland)
,
Dominik M.
(Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland)
,
Smietana M.
(Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland)
,
Cichomski M.
(University of Lodz, Faculty of Chemistry, Department of Materials Technology and Chemistry, Pomorska 163, 90-236 Lodz, Poland)
,
Szymanski W.
(Lodz University of Technology, Institute Materials Science and Engineering, 1/15, Stefanowskiego, 90-924 Lodz, Poland)
,
Bystrzycka E.
(University of Lodz, Faculty of Chemistry, Department of Materials Technology and Chemistry, Pomorska 163, 90-236 Lodz, Poland)
,
Prowizor M.
(University of Lodz, Faculty of Chemistry, Department of Materials Technology and Chemistry, Pomorska 163, 90-236 Lodz, Poland)
,
Kozlowski W.
(University of Lodz, Faculty of Physics and Applied Informatics, Department of Solid State Physics, Pomorska 149/153, 90 236 Lodz, Poland)
,
Dudek M.
(Lodz University of Technology, Institute Materials Science and Engineering, 1/15, Stefanowskiego, 90-924 Lodz, Poland)
資料名:
Surface & Coatings Technology
(Surface & Coatings Technology)
巻:
329
ページ:
212-217
発行年:
2017年
JST資料番号:
D0205C
ISSN:
0257-8972
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)